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LAM Research 605-108114-003 Etch Chamber Component

  • Model: 605-108114-003
  • Brand: LAM Research
  • Series: LAM Plasma Etch Equipment
  • Core Function: Plasma process gas distribution
  • Product Type: Etch chamber shower head / process component
  • Base Material: Aluminum alloy, reported as 6061-T6
  • Surface: Plasma-resistant coated surface
  • Application: Semiconductor wafer dry etching
  • Wafer Platform: Reported for 200 mm / 300 mm applications
  • Condition: Verify Factory Sealed / New Surplus / Refurbished condition before purchase

⚠️ Identification Note: Public secondary-market information identifies 605-108114-003 as a LAM Research plasma-etch chamber component, described specifically as a coated aluminum shower head. The available evidence is from aftermarket sources rather than a LAM Research OEM datasheet, so chamber-level compatibility should be verified from the equipment documentation before installation.

Categories: , , , , SKU: 605-108114-003 Brand:

Description

Key Technical Specifications

Parameter Value
Manufacturer LAM Research
Part Number 605-108114-003
Component Type Plasma etch chamber shower head
Equipment Category Semiconductor wafer processing
Process Dry plasma etching
Base Material 6061-T6 aluminum, reported
Coating Yttria-stabilized zirconia (YSZ), reported
Reported Coating Thickness 150–300 μm
Reported Operating Temperature Up to 350 °C
Orifice Diameter Approximately 0.5–1.5 mm, reported
Surface Finish Ra ≤ 0.8 μm machined / Ra ≤ 1.6 μm coated, reported
Wafer Compatibility 200 mm / 300 mm applications reported
Chamber Compatibility LAM 2300, Flex, Polygon and other platforms reported
Process Function Uniform process-gas distribution
Part Category Chamber consumable / process hardware

The available listing describes 605-108114-003 as a precision-machined, coated aluminum shower head that distributes process gas across the wafer during plasma etching. It also reports an array of precision orifices and a coated surface intended for exposure to reactive plasma chemistry.

The reported specifications above should not be treated as OEM-certified limits. In particular, coating composition, thickness, chamber compatibility, and service-life figures should be checked against the applicable LAM Research equipment documentation before procurement or installation.

 

Product Introduction

The LAM Research 605-108114-003 is identified in aftermarket documentation as a plasma-etch chamber shower head used in semiconductor wafer-processing equipment. Its function is to distribute process gas through a precision-machined orifice pattern during dry plasma etching.

This is a process-chamber component, not an electrical control module. Replacement therefore depends primarily on chamber configuration, wafer size, gas-flow geometry, sealing arrangement, coating condition, and process recipe rather than PLC or fieldbus compatibility.

605-108114-003

605-108114-003

605-108114-003

605-108114-003

Installation & Configuration Guide

Estimated replacement time: 30–90 minutes for an experienced semiconductor-equipment technician, excluding chamber conditioning and qualification.

Stage 1: Pre-Installation Preparation

⚠️ Safety First

  1. Place the etch tool into the approved maintenance state.
  2. Follow the equipment-specific shutdown procedure.
  3. Isolate electrical, pneumatic, vacuum, RF, and process-gas energy sources as required.
  4. Confirm the chamber is at a safe temperature.
  5. Verify the chamber is vented according to the OEM procedure.
  6. Follow the fab’s contamination-control and cleanroom procedures.

Tools Required

  • Approved cleanroom gloves
  • Cleanroom-compatible hand tools
  • Torque-controlled screwdriver or wrench
  • Approved cleaning materials
  • Inspection light
  • Camera for documentation
  • Appropriate PPE specified by the facility

Part Verification

Before opening the chamber:

  1. Confirm the replacement marking is 605-108114-003.
  2. Compare the old and new components dimensionally.
  3. Verify:
    • Orifice pattern
    • Mounting-hole arrangement
    • Gas inlet/interface geometry
    • Seal/O-ring groove
    • Coating condition
    • Surface finish
  4. Photograph the original installation.

⚠️ Do not install based solely on the part number. Chamber revision and process configuration can determine whether a mechanically similar component is actually suitable.

Stage 2: Removing the Existing Component

  1. Confirm the chamber has completed its approved shutdown sequence.
  2. Verify temperature and pressure conditions.
  3. Remove chamber covers according to the equipment manual.
  4. Photograph the installed component before removal.
  5. Remove retaining hardware in the specified sequence.
  6. Lift the shower head straight out without scraping chamber surfaces.
  7. Protect the removed component from contamination.
  8. Inspect the chamber interface.

Check specifically for:

  • Coating deposits
  • Plasma erosion
  • Cracks
  • Scratches
  • Warping
  • Blocked or damaged orifices
  • O-ring damage
  • Foreign-particle contamination

Estimated time: 20–40 minutes.

Stage 3: Installing the New Component

  1. Keep the replacement sealed until the chamber is ready.
  2. Use approved cleanroom handling procedures.
  3. Verify the component orientation.
  4. Inspect the coating under suitable lighting.
  5. Clean only according to the equipment/OEM procedure.
  6. Verify the sealing surface is clean.
  7. Install the appropriate seal or O-ring.
  8. Position the shower head without contacting critical surfaces.
  9. Install retaining hardware.
  10. Apply the OEM-specified tightening sequence and torque.

⚠️ The aftermarket source reports 5–7 N·m for mounting bolts, but this should not be treated as a universal LAM Research specification. Use the torque value specified for the actual chamber model and revision.

Self-Checklist

  • Correct 605-108114-003 part number
  • Correct chamber revision
  • Orifice pattern verified
  • Coating visually inspected
  • Seal installed correctly
  • Mounting surfaces clean
  • Correct torque applied
  • No foreign particles introduced

Stage 4: Vacuum and Process Verification

  1. Close the chamber.
  2. Perform the prescribed chamber leak check.
  3. Verify vacuum reaches the expected base pressure.
  4. Check process-gas flow and pressure response.
  5. Verify RF/plasma ignition using the approved maintenance procedure.
  6. Monitor chamber pressure stability.
  7. Run the applicable chamber qualification or conditioning sequence.
  8. Review wafer/process-monitor results before returning the chamber to production.

⚠️ Do not qualify the replacement solely by achieving vacuum. Gas distribution can be incorrect even when the chamber passes a basic leak test.

 

Frequently Asked Questions (FAQ)

1. What is LAM Research 605-108114-003?

It is identified by aftermarket sources as a plasma-etch chamber shower head/process component used in LAM Research semiconductor wafer-processing equipment. Its reported function is to distribute process gas through a precision-machined orifice array.

2. Is 605-108114-003 an electronic control board?

No. Available product documentation identifies it as a mechanical chamber component, rather than a PLC, PCB, servo drive, or electronic I/O module.

3. What material is 605-108114-003 made from?

The available aftermarket specification identifies the base material as 6061-T6 aluminum with a reported YSZ coating. Because these material specifications are not confirmed by a publicly available LAM Research OEM datasheet, verify the exact construction against the chamber documentation before using it for process qualification.

4. Which LAM Research equipment uses this part?

One aftermarket listing associates the part with LAM 2300, Flex, Polygon, and other etch platforms, but this should be treated as a supplier-reported compatibility list rather than an OEM-approved interchangeability statement.

5. Can I substitute 605-108114-001 or another shower head?

Do not assume so.

A visually similar shower head can have different:

  • Orifice geometry
  • Gas-flow distribution
  • Mounting dimensions
  • Coating
  • Sealing arrangement
  • Chamber compatibility

Those differences can affect plasma uniformity and process results. Match the exact equipment configuration before substitution.

6. Is a used 605-108114-003 acceptable?

It depends on the process requirements. For a used component, inspect:

  • Coating erosion
  • Orifice condition
  • Flatness
  • Cracks
  • Contamination
  • Seal surfaces
  • Previous process history

For critical semiconductor processes, request dimensional inspection and cleaning/coating documentation where available.

7. What should I provide when ordering a replacement?

Provide the complete 605-108114-003 number plus:

  • LAM equipment model
  • Chamber/module number
  • Wafer size
  • Current shower-head photographs
  • Coating specification if documented
  • Process chemistry, where relevant
  • Required condition: Factory Sealed, New Surplus, or Refurbished

That information is more useful than the part number alone when establishing chamber compatibility.